Toshiba develops molecular photoresist technology for EUV lithography (PhysOrg)

Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world’s first 20nm-scale generation process technology.
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Tags: Corporation, extreme ultraviolet lithography, nano, nanotech, nanotechnology, photoresist, process technology, resolution, semiconductor fabrication, sensitive film, Technology, today, Toshiba, toshiba corporation

This entry was posted on Wednesday, November 18th, 2009 at 10:51 am and is filed under News.