STMicroelectronics Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography (Business Wire via Yahoo! Finance)

CROLLES & GRENOBLE, France—-STMicroelectronics and CEA-Leti, the leading French semiconductor research institute, have signed an agreement for STMicroelectronics to join the new industry/research multi-partner program IMAGINE, led by CEA-Leti, which includes TSMC, for mask-less lithography for IC manufacturing.
(read the story…)

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Tags: amp, CEA-Leti, CROLLES, GRENOBLE, grenoble france, nano, nanotech, nanotechnologie, nanotechnologies, Research, semiconductor research, STMicroelectronics

This entry was posted on Monday, January 18th, 2010 at 10:52 pm and is filed under Business.